How a CPU is made? [HD Graphics]

Published: 19 January 2022 | Last Updated: 07 January 202613962
Hello everyone, I am Rose. Welcome back to the new post today. The CPU, sometimes known as a "microprocessor," is the heart of modern computers. The specs and frequencies of the CPU are frequently regarded as crucial indicators of a computer's performance in PCs.
In this video I wil show you how a CPU is made.

How a CPU is made

2026 Executive Summary: How CPUs Are Made

The core of CPU manufacturing is Photolithography using Extreme Ultraviolet (EUV) light. Starting with 99.9999% pure electronic-grade silicon derived from sand, manufacturers process 300mm wafers through hundreds of steps. As of January 2026, the industry standard has moved to Angstrom-era nodes (2nm/18A), utilizing Gate-All-Around (GAA) transistor architecture to fit over 50 billion transistors onto a single consumer chip. This guide covers the end-to-end process from silicon ingot to packaged processor.

Topics covered in this article:
1. What are the raw materials for modern CPUs?
2. Silicon Purification and Ingot Creation
3. Photolithography and EUV Technology
4. Doping and Ion Implantation
5. Interconnects and Layering
6. Testing, Binning, and Packaging
7. Visual Step-by-Step Guide (From Sand to Chip)


The CPU, often referred to as the "brain" or "microprocessor," serves as the computational engine of modern computers and AI systems. As of 2026, the complexity of these chips has skyrocketed, with specifications and clock speeds acting as critical benchmarks for performance in PCs, data centers, and edge devices. The Intel x86 architecture has now evolved over nearly five decades, and modern iterations (along with ARM and RISC-V) continue to drive the digital economy.

 Close-up of a modern CPU die layout showing core architecture

The transistor remains the fundamental building block of the CPU. To increase processing power in 2026, engineers must fit billions of transistors into a chip no larger than a fingernail. Because these components are now measured in Angstroms (0.1 nanometers), human hands cannot assemble them; they are manufactured using advanced robotic photolithography.

A transistor is essentially a microscopic binary switch: on (1) or off (0). While early computers used vacuum tubes, today's Angstrom-era chips contain logic gates that switch billions of times per second. In this detailed guide, we will walk you through the sophisticated fabrication process of a Central Processing Unit, transforming a pile of silicon sand into a powerful integrated circuit.

 

1. What are the raw materials for modern CPUs?

The primary raw material for CPUs is silicon, extracted from silica sand (silicon dioxide). While it seems improbable that high-performance AI processors originate from common sand, the secret lies in the purification process. Manufacturers cannot use standard beach sand; they must extract and purify silicon to an "Electronic Grade" purity of 99.9999% (often called "nine nines"). If the silicon substrate is not perfectly pure, the electrons cannot flow efficiently, rendering the high-performance processor useless.

Raw silicon sand alongside a finished CPU processor

Beyond silicon, modern CPUs utilize a complex stack of metals and rare earth elements. While aluminum was used historically, copper is the standard for interconnects due to its superior conductivity, though 2026 processes are now integrating Cobalt and Ruthenium for the smallest connections to prevent electromigration. Electromigration occurs when high-speed electrons physically displace atoms in the wire, creating voids (open circuits) or hillocks (short circuits), which can permanently destroy a chip's logic.

 

2. Silicon Purification and Ingot Creation

Before chip fabrication begins, the raw silicon must be transformed into a single crystal structure. The purified silicon is melted in a quartz crucible at temperatures exceeding 1,400°C (2,500°F). To ensure the necessary electronic properties, a "seed crystal" is lowered into the melt and slowly rotated and pulled upward.

Molten silicon being formed into an ingot

This process, known as the Czochralski method, produces a cylindrical ingot of monocrystalline silicon. As of 2026, the industry standard for these ingots is 300mm (12 inches) in diameter. The internal atomic structure must be perfectly aligned to allow electron flow.

Once the ingot is formed, it is sliced into wafers approximately 0.7mm thick. These wafers are polished to a mirror-perfect finish; any surface imperfection larger than a few nanometers can ruin the final circuitry. Intel and TSMC invest billions in fabrication plants ("fabs") capable of handling these 300mm wafers, as larger wafers allow for more chips to be produced simultaneously, reducing the cost per unit.

 

3. Photolithography and EUV Technology

Photolithography is the process of printing circuit patterns onto the silicon wafer using light. In the 2026 manufacturing landscape, this is achieved using Extreme Ultraviolet (EUV) lithography. A photosensitive chemical called "photoresist" is spun onto the wafer. The wafer is then exposed to deep ultraviolet light passed through a "mask" (stencil) that contains the circuit blueprint.

This step is incredibly complex because the features being printed are smaller than the wavelength of visible light.

  • Wavelength: Modern High-NA EUV systems use light with a wavelength of just 13.5 nanometers.

  • Precision: The precision required is equivalent to hitting a golf ball into a specific hole on the moon.

  • Complexity: A modern CPU requires over 50 to 80 separate masking layers to build the 3D structure of the transistors.

 Photolithography scanner exposing a silicon wafer

When the light hits the photoresist, it changes the chemical solubility of the exposed areas. These areas are then washed away, revealing the silicon dioxide or substrate underneath, ready for etching.

 

4. Doping and Ion Implantation

Doping is the process of bombarding exposed silicon areas with ions to alter their electrical conductivity. After the photolithography creates the pattern, the wafer is subjected to ion implantation. Atoms such as Boron or Phosphorus are shot into the silicon lattice at high speeds.

This transforms the silicon from an insulator into a semiconductor. This creates the N-type (negative) and P-type (positive) regions essential for the transistor's function.    

   2026 Technology Note: While older chips used planar (flat) transistors, modern CPUs use GAA (Gate-All-Around) or RibbonFET technology. In this architecture, the "gate" surrounds the channel on all four sides, allowing for superior control over power leakage and enabling higher performance at lower voltages.

 

5. Interconnects and Layering

Once the transistors are formed on the silicon base, they must be wired together. This is done by building layers of metal interconnects above the transistors.

  • Insulation: Dielectric materials are added to separate the layers.

  • Vias: Tiny vertical holes are etched and filled with metal to connect different layers.

  • Scale: A modern processor may have over 15 to 20 layers of metal wiring.

The resulting structure looks like a multi-story highway system, where signals travel between billions of transistors at the speed of light.

 

6. Testing, Binning, and Packaging

After the fabrication on the wafer is complete, the individual dies are tested while still on the silicon disk. This is known as "wafer sort." Probes apply voltage to check for defects.

Wafer testing probe card inspection

The wafer is then sliced into individual chips (dies) using diamond saws or lasers. Functional dies are packaged—mounted onto a green substrate and covered with a heat spreader (IHS).

The Binning Process: Not all chips are created equal. Due to microscopic variations in the manufacturing process, some chips perform better than others.

  • High Bin: Chips that remain stable at high voltages and frequencies are labeled as premium models (e.g., Core Ultra 9 or Ryzen 9).

  • Mid/Low Bin: Chips with slight imperfections or lower efficiency are locked to lower speeds and sold as mid-range or budget processors (e.g., Core Ultra 5).

  • Disabled Cores: If a specific core is defective, it is permanently disabled, and the chip is sold as a model with fewer cores.

This maximizes yield and reduces waste, explaining why a single production line produces multiple CPU models.

 

7. Visual Step-by-Step Guide (From Sand to Chip)

Note: The following diagrams illustrate the foundational Intel manufacturing workflow. While modern 2026 techniques (like GAAFET and High-NA EUV) are more complex, the fundamental stages remain consistent.

Step 1: Sand Collection. Silicon is the second most prevalent element in the Earth's crust. Deoxygenated sand (quartz) contains up to 25% silicon.

 Sand containing silicon dioxide

Step 2: Silicon Smelting. Sand is purified into Electronic Grade Silicon (EGS) with less than one impurity atom per billion silicon atoms.

 Purified silicon smelting process

Step 3: Ingot Formation. The result is a monocrystalline ingot, weighing approx 100kg with 99.9999% purity.

 Monocrystalline silicon ingot

Step 4: Wafer Slicing. The ingot is sliced into thin 300mm wafers and polished to a mirror finish.

 Slicing silicon wafers

Step 5: Photoresist Application. A blue photosensitive liquid is spun onto the wafer surface.

 Applying photoresist liquid

Step 6: Photolithography Exposure. UV light passes through a stencil (mask) to project the circuit design onto the wafer, shrinking the pattern by 4x.

 UV light exposure via scanner

Step 7: Etching. Chemicals dissolve the exposed soft photoresist and etch away the silicon oxide substrate to create channels.

 Chemical etching process

Step 8: Ion Implantation. The silicon is bombarded with ions to create conductive N/P regions.

Ion implantation diagram

Step 9: Copper Electroplating. Copper is deposited into the etched trenches to create the transistors' electrical connections.

Copper electroplating bath

Step 10: Polishing & Interconnects. Excess copper is polished off, and multiple metal layers are built up to connect transistors.

Microscopic view of interconnect layers

Step 11: Wafer Slicing & Sort. The wafer is cut into individual dies. Defective dies are discarded.

 Slicing wafer into dies

Step 12: Final Packaging. The functional die is mounted on a substrate and covered with a heat spreader.

 Final CPU Package Assembly


Frequently Asked Questions about CPU Manufacturing

1. What does the "nanometer" (nm) process node mean in 2026?

Originally, this referred to the actual size of the transistor gate. In 2026, terms like "2nm" or "18A" (Angstrom) are marketing terms indicating generation density and efficiency rather than exact physical dimensions. A smaller number implies higher transistor density, better power efficiency, and faster performance.


2. Why are modern CPUs so expensive?

The cost is driven by the astronomical investment required for fabrication. A modern fab costs over $20 billion to build. The EUV lithography machines alone cost upwards of $350 million each. Additionally, the process involves thousands of steps, and a single mistake can ruin months of work, resulting in "yield loss" that drives up the price of successful chips.


3. Why use Copper instead of Silver?

While silver is slightly more conductive, it oxidizes rapidly and is prone to migration problems. Copper (and now Cobalt for tiny layers) offers the best balance of conductivity, reliability, and cost. Modern contacts are often gold-plated to prevent corrosion at the connection points.


4. How long does it take to make a single CPU?

From the moment a raw silicon wafer enters the fab to the time it is packaged as a finished CPU, the process takes approximately 3 to 4 months.


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